A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

Shi, Xiaolei ORCID: https://orcid.org/0000-0003-0905-2547 and Pan, Guoshun and Zhou, Yan and Xu, Li and Zou, Chunli and Gong, Hua (2015) A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing. Surface and Coatings Technology, 270. pp. 206-220. ISSN 0257-8972


Abstract

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing is presented. The results demonstrated that the formation and removal of chemical products both proceeded from the hexagonal close-packed sapphire Al-O layers described as atomic terraces, and the material removal rule of sapphire (0001) during chemical–mechanical polishing is the regular removal of chemical products formed from the atomic terraces, which were successfully characterized by AFM with super-sharp scanning probes. Besides, we also found that the surface with screw dislocations could not be polished completely by CMP due to the crystal distortion energy, and a hard polishing pad could remove scratches more effectively than a soft one.


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Item Type: Article (Commonwealth Reporting Category C)
Refereed: Yes
Item Status: Live Archive
Faculty/School / Institute/Centre: No Faculty
Faculty/School / Institute/Centre: No Faculty
Date Deposited: 14 Oct 2020 01:23
Last Modified: 02 Nov 2020 05:13
Uncontrolled Keywords: Sapphire substrate; Chemical–mechanical polishing; Step-terrace structure; Chemical products; Material removal mechanism
Fields of Research (2008): 09 Engineering > 0912 Materials Engineering > 091299 Materials Engineering not elsewhere classified
Fields of Research (2020): 40 ENGINEERING > 4016 Materials engineering > 401699 Materials engineering not elsewhere classified
Identification Number or DOI: https://doi.org/10.1016/j.surfcoat.2015.02.053
URI: http://eprints.usq.edu.au/id/eprint/39888

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