Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry

Zhou, Yan and Pan, Guoshun and Shi, Xiao-Lei ORCID: https://orcid.org/0000-0003-0905-2547 and Gong, Hua and Luo, Guihai and Gu, Zhonghua (2014) Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry. Surface and Coatings Technology, 251. pp. 48-55. ISSN 0257-8972


Abstract

The application of catalyst nanoparticles in the slurry is developed for chemical mechanical planarization (CMP) of on-axis Si-face (0001) SiC wafer, so as to obtain higher material removal rate (MRR) and defect-free ultra-smooth surface. Fe nanoparticles, as well as Pt/C nanoparticles were used as a catalyst into the slurry, and the polishing experiment results indicate that an Fe catalyst is preferable to CMP of SiC. The removal behaviors of catalyst assisted CMP were studied and the removal mechanism was discussed. The detection results of *OH hydroxyl radicals reveal that the slurries with catalysts could produce *OH radicals so as to induce the oxidation of SiC. The relationship between the removal of SiC wafer by different catalysts and polishing time was investigated. The removal characteristics with different downward pressure and platen rotation speed and relative local temperature were presented. Optical microscope, optical interferometry profiler and atomic force microscope (AFM) were applied to observe the processed surface by the proposed method. Total planarization of the atomically flat defect-free surface with atomic step-terrace structure and extremely low Ra about 0.05 nm was achieved for SiC wafer by using an Fe catalyst slurry. The results affirm that the promising method is helpful to the surface preparation of super-hard and inert materials with high efficiency and high flatness.


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Item Type: Article (Commonwealth Reporting Category C)
Refereed: Yes
Item Status: Live Archive
Additional Information: Permanent restricted access to Published version in accordance with the copyright policy of the publisher.
Faculty/School / Institute/Centre: No Faculty
Faculty/School / Institute/Centre: No Faculty
Date Deposited: 15 Sep 2020 02:41
Last Modified: 15 Sep 2020 04:27
Uncontrolled Keywords: silicon carbide; chemical mechanical planarization; catalyst; removal; atomic step structure
Fields of Research (2008): 09 Engineering > 0912 Materials Engineering > 091205 Functional Materials
Identification Number or DOI: 10.1016/j.surfcoat.2014.03.044
URI: http://eprints.usq.edu.au/id/eprint/38917

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