Robust free-standing nano-thin SiC membranes enable direct photolithography for MEMS sensing applications

Phan, Hoang-Phuong and Nguyen, Tuan-Khoa and Dinh, Toan ORCID: https://orcid.org/0000-0002-7489-9640 and Iacopi, Alan and Hold, Leonie and Shiddiky, Muhammad J. A. and Dao, Dzung Viet and Nguyen, Nam-Trung (2017) Robust free-standing nano-thin SiC membranes enable direct photolithography for MEMS sensing applications. Advanced Engineering Materials, 20 (1):1700858. ISSN 1438-1656


Abstract

This work presents fabrication of micro structures on sub–100 nm SiC membranes with a large aspect ratio up to 1:3200. Unlike conventional processes, this approach starts with Si wet etching to form suspended SiC membranes, followed by micro‐machined processes to pattern free‐standing microstructures such as cantilevers and micro bridges. This technique eliminates the sticking or the under‐etching effects on free‐standing structures, enhancing mechanical performance which is favorable for MEMS applications. In addition, post‐Si‐etching photography also enables the formation of metal electrodes on free standing SiC membranes to develop electrically‐measurable devices. To proof this concept, the authors demonstrate a SiC pressure sensor by applying lithography and plasma etching on released ultrathin SiC films. The sensors exhibit excellent linear response to the applied pressure, as well as good repeatability. The proposed method opens a pathway for the development of self‐sensing free‐standing SiC sensors.


Statistics for USQ ePrint 38186
Statistics for this ePrint Item
Item Type: Article (Commonwealth Reporting Category C)
Refereed: Yes
Item Status: Live Archive
Additional Information: Files associated with this item cannot be displayed due to copyright restrictions.
Faculty/School / Institute/Centre: Current - Faculty of Health, Engineering and Sciences - School of Mechanical and Electrical Engineering (1 Jul 2013 -)
Faculty/School / Institute/Centre: Current - Faculty of Health, Engineering and Sciences - School of Mechanical and Electrical Engineering (1 Jul 2013 -)
Date Deposited: 06 Aug 2020 02:15
Last Modified: 11 Sep 2020 00:59
Uncontrolled Keywords: MEMS; photolithography process; pressure sensors; self-sensing devices; silicon carbide
Fields of Research (2008): 09 Engineering > 0913 Mechanical Engineering > 091306 Microelectromechanical Systems (MEMS)
Fields of Research (2020): 40 ENGINEERING > 4017 Mechanical engineering > 401705 Microelectromechanical systems (MEMS)
Socio-Economic Objectives (2008): E Expanding Knowledge > 97 Expanding Knowledge > 970109 Expanding Knowledge in Engineering
Identification Number or DOI: https://doi.org/10.1002/adem.201700858
URI: http://eprints.usq.edu.au/id/eprint/38186

Actions (login required)

View Item Archive Repository Staff Only